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  Corporate Chronology
 
Jul 2004 GET incorporated
Apr 2005 Start Production with 25MW
May 2005 First Ingot
Jul 2005 125mm x 125mm x 0.325mm wafer
Aug 2005 0.270mm wafer
Sep 2005 156mm x 15m6m x 0.270mm wafer
Jan 2006 240um wafer
Jul 2006 220um wafer
Aug 2006 Expansion to 50 MW
Nov 2006 Expansion to 65 MW
Jan 2007 180um wafer capability verified
Feb 2007 Restart production with 37 MW capacity
Mar 2007 Capacity up to 82 MW
May 2007 Capacity up to 115 MW
Jun 2007 Thin-Film project kick-off
Dec 2007 TF plant ground breaking
Jan 2008 Muti-crystalline wafer size upgrades from 156x156x200um to 180um
Jun 2008 Wafer annual capacity up-scales to 200MW
 
 
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